ACM Research Delivered Its First High-Throughput Ultra Lith KrF Track System to a Leading Chinese Logic Wafer Fab Customer

New Extremely Lith _KrF Monitor System Delivers Excessive-Throughput Efficiency with Proprietary Platform Design, Driving Superior Course of Management for Mature-node Lithography Functions

FREMONT, Calif., Sept. 07, 2025 (GLOBE NEWSWIRE) —  ACM Research, Inc. (“ACM”) (NASDAQ: ACMR), a number one provider of wafer and panel processing options for semiconductor and superior packaging functions, as we speak introduced the launch of its first Extremely Lith _KrF observe system, designed to assist front-end semiconductor manufacturing. The brand new system expands ACM’s lithography product line and delivers high-throughput efficiency, superior thermal management, and real-time course of management and monitoring. The primary system was shipped to a number one Chinese language logic wafer fab buyer in September 2025.

ACM’s Extremely Lith _KrF observe system builds on the confirmed structure and course of achievements of ACM’s ArF observe platform, which efficiently accomplished demo-line course of verification with a number one Chinese language buyer in late 2024. That system demonstrated sub-angstrom-level coating uniformity, superior thermal management, and ASML scanner-aligned CD matching—capabilities that supplied the muse for design optimization within the KrF platform.

“The launch of ACM’s Extremely Lith _KrF observe system expands ACM’s presence in front-end course of gear and displays our dedication to handle a broader vary of lithography challenges,” stated Dr. David Wang, President and Chief Government Officer of ACM. “KrF lithography stays important for mature-node gadgets, which ACM believes characterize a big and rising portion of worldwide semiconductor output. By providing each ArF and KrF observe programs, ACM permits seamless fab integration and larger manufacturing flexibility throughout various functions.”

ACM’s Extremely Lith _KrF observe system includes a versatile course of module configuration, together with 12 spin coaters and 12 builders (12C12D), supported by 54 sizzling plates able to low, mid, and high-temperature processing with industry-leading thermal uniformity. The system achieves throughput larger than 300 wafers per hour (WPH) and incorporates ACM’s proprietary bottom particle elimination unit (BPRV) expertise to reduce cross-contamination danger. As well as, the built-in wafer-scale outlier inspection (WSOI) unit permits real-time course of variation detection and yield anomaly monitoring, enhancing course of stability and manufacturing effectivity.

Ahead-Trying Statements

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About ACM Analysis, Inc.

ACM develops, manufactures and sells semiconductor course of gear spanning cleansing, electroplating, stress-free sharpening, vertical furnace processes, observe, PECVD, and wafer- and panel-level packaging instruments, enabling superior and semi-critical semiconductor system manufacturing. ACM is dedicated to delivering custom-made, high-performance, cost-effective course of options that semiconductor producers can use in quite a few manufacturing steps to enhance productiveness and product yield. For extra info, go to http://www.acmr.com.

© ACM Analysis, Inc. Extremely Lith and the ACM Analysis emblem are emblems of ACM Analysis, Inc. For comfort, these emblems seem on this press launch with out ™ symbols, however that apply doesn’t imply ACM won’t assert, to the fullest extent beneath relevant legislation, its rights to such emblems. All different emblems are the property of their respective house owners.